Display device and method of manufacturing same

A display device comprising:

• a display area including a thin film transistor on a substrate, and a display element including a pixel electrode, an intermediate layer, and an opposite electrode sequentially stacked;
• a non-display area adjacent to the display area and including a bent area;
• an inner wiring and an outer wiring mutually spaced apart from each other with the bent area therebetween;
• an inter-insulating layer which is disposed on the inner wiring and the outer wiring and in which an opening corresponding to the bent area is defined;
• a connection wiring electrically connecting the inner wiring to the outer wiring and passing across the bent area;
• and
• a first organic insulating layer disposed in the display area and the non-display area, a portion of the first organic insulating layer being located in the opening of the inter-insulating layer,
• wherein the connection wiring is disposed below the pixel electrode with an insulating layer therebetween.

A method of manufacturing a display device, the method comprising:

• forming a thin film transistor and a storage capacitor in a display area;
• forming an inner wiring and an outer wiring in a non-display area, the inner wiring and the outer wiring being spaced apart from each other around a bent area;
• forming an inter-insulating layer which is disposed on the inner wiring and the outer wiring, and in which an opening corresponding to the bent area is defined;
• forming a connection metal connected to the thin film transistor;
• forming a conductive layer connected to the inner wiring and the outer wiring;
• forming an inorganic protective layer covering the connection metal and the conductive layer;
• and
• etching the inorganic protective layer to define a hole exposing the connection metal, a first contact hole exposing the conductive layer, and an opening corresponding to the bent area,
• wherein the etching the inorganic protective layer comprises:
• etching at least one lower inorganic insulating layer provided below the inorganic protective layer such that an opening corresponding to the bent area is defined in the at least one lower inorganic insulating layer.