# US 2019/0164931 A1 · Bonding and placement tools for bonding machines, bonding machines for bonding semiconductor elements, and related methods

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- Number: US 2019/0164931 A1
- Document ID: US20190164931A1
- Status: Published application
- Kind: A1
- Application number: 16/150,362
- Filed: 2018-10-03
- Published: 2019-05-30
- Earliest claimed: 2017-11-29
- Assignees: Kulicke and Soffa Industries, Inc.
- Applicants: Kulicke and Soffa Industries, Inc.
- Inventors: Ai Jun Song; Daniel P. Buergi; Horst Clauberg; Matthew E. Tarabulski; Matthew B. Wasserman
- Web page: https://patentgrep.com/patent/US20190164931A1

## CPC

- B23K 3/04: Heating appliances
- B23K 1/0016: {Soldering of electronic components}
- B23K 3/047: electric
- B23K 2101/40: Semiconductor devices
- B23K 2103/56: {being semiconducting}
- H05K 2201/10674: Flip chip
- H10W 72/07141: {Means for applying energy, e.g. ovens or lasers}
- H10W 72/07178: {Means for aligning}
- H10W 72/07232: {Compression bonding, e.g. thermocompression bonding}
- H10W 72/07236: {Soldering or alloying}
- H10W 72/07332: {Compression bonding, e.g. thermocompression bonding}
- H10W 72/252: {comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu}
- B23K: SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10

## Abstract

A bonding tool for bonding a semiconductor element to a substrate on a bonding machine is provided. The bonding tool includes a body portion including a contact region for contacting the semiconductor element during a bonding process on the bonding machine. The body portion defines a non-contact region adjacent the contact region. The bonding tool also includes a heat resistant coating applied to the non-contact region.

## Claims

### Claim 1

A bonding tool for bonding a semiconductor element to a substrate on a bonding machine, the bonding tool comprising:
a body portion including a contact region for contacting the semiconductor element during a bonding process on the bonding machine, the body portion defining a non-contact region adjacent the contact region; and
a heat resistant coating applied to the non-contact region.

### Claim 2 (depends on 1)

The bonding tool of claim 1 wherein the heat resistant coating includes a low heat emissivity material.

### Claim 3 (depends on 1)

The bonding tool of claim 1 wherein the heat resistant coating includes a low thermal conductivity material.

### Claim 4 (depends on 1)

The bonding tool of claim 1 wherein the heat resistant coating includes a plurality of layers.

### Claim 5 (depends on 4)

The bonding tool of claim 4 wherein the plurality of layers includes a low heat emissivity layer and a low thermal conductivity layer.

### Claim 6 (depends on 5)

The bonding tool of claim 5 wherein the low heat emissivity layer is provided on the low thermal conductivity layer.

### Claim 7 (depends on 1)

The bonding machine of claim 1 wherein the heat resistant coating has an emissivity of between 0.02 and 0.5.

### Claim 8 (depends on 1)

The bonding tool of claim 1 wherein the heat resistant coating is applied to the body portion using at least one of sputtering or electroplating.

### Claim 9 (depends on 1)

The bonding tool of claim 1 wherein the heat resistant coating includes gold.

### Claim 10 (depends on 1)

The bonding tool of claim 1 wherein the bonding tool is a placement tool for use in a thermocompression bonding operation on the bonding machine.

### Claim 11 (depends on 1)

The bonding tool of claim 1 wherein the bonding tool is a heated bonding tool for heating the semiconductor element.

### Claim 12 (depends on 1)

The bonding tool of claim 1 wherein the bonding tool is engaged with a distinct heater for heating the semiconductor element.

### Claim 13 (depends on 1)

The bonding tool of claim 1 wherein the non-contact region is a stepped region.

### Claim 14 (depends on 1)

The bonding tool of claim 1 wherein the heat resistant coating is also applied to the contact region.

### Claim 15

A bonding machine for bonding a semiconductor element to a substrate, the bonding machine comprising:
a bonding tool, the bonding tool including a body portion including a contact region for contacting the semiconductor element during a bonding process on the bonding machine, the body portion defining a non-contact region adjacent the contact region, the bonding tool also including a heat resistant coating applied to the non-contact region; and
a support structure for supporting the substrate.

### Claim 16 (depends on 15)

The bonding machine of claim 15 further comprising a bond head assembly for carrying the bonding tool.

### Claim 17 (depends on 15)

The bonding machine of claim 15 wherein the bonding tool is a placement tool for use in a thermocompression bonding operation on the bonding machine.

### Claim 18 (depends on 15)

The bonding machine of claim 15 wherein the heat resistant coating includes a low heat emissivity material.

### Claim 19 (depends on 15)

The bonding machine of claim 15 wherein the heat resistant coating includes a low thermal conductivity material.

### Claim 20 (depends on 15)

The bonding machine of claim 15 wherein the heat resistant coating is applied also to the contact region.

### Claim 21

A method of processing a bonding tool, the method comprising the steps of:
(a) providing a bonding tool, the bonding tool including a body portion including a contact region for contacting a semiconductor element during a bonding process on a bonding machine, the body portion defining a non-contact region adjacent the contact region; and
(b) applying a heat resistant coating to the non-contact region.

### Claim 22 (depends on 21)

The method of claim 21 wherein the heat resistant coating includes a low heat emissivity material, and wherein step (b) includes applying the low heat emissivity material to the non-contact region.

### Claim 23 (depends on 21)

The method of claim 21 wherein the heat resistant coating includes a low thermal conductivity material, and wherein step (b) includes applying the low thermal conductivity material to the non-contact region.

### Claim 24 (depends on 21)

The method of claim 21 wherein the heat resistant coating includes a plurality of layers, and wherein step (b) includes (i) applying a first of the plurality of layers to the non-contact region and (ii) applying a second of the plurality of layers to the first layer on the non-contact region.

### Claim 25 (depends on 24)

The method of claim 24 wherein the first of the plurality of layers is a low thermal conductivity layer, and the second of the plurality of layers is a low heat emissivity layer.

### Claim 26 (depends on 21)

The method of claim 21 wherein step (b) including also applying the heat resistant coating to the contact region.
