Mark, method for forming same, and exposure apparatus

A method for producing a device comprising:

• forming a pre-pattern on a mark formation area of a substrate;
• applying a polymer layer containing a block copolymer to the pre-pattern;
• allowing the polymer layer, applied to the pre-pattern, to form a self-assembled area;
• selectively removing a portion of the self-assembled area;
• forming an alignment mark by using the self-assembled area from which the portion of the self-assembled area has been removed;
• illuminating the alignment mark formed on the substrate with an illumination light;
• detecting the alignment mark by receiving a light from the alignment mark with a detector;
• and
• changing a polarization state of the illumination light.