Systems and methods for fixed focus ring processing
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHuan-Lisng TZENG, Chen-Chun Yan, Yao-Pin Yang
Life of this patent
Estimating the term…
Abstract
In an embodiment, a system includes: a base with a bore hole, wherein the base is configured to secure a wafer at a first position on the base; a pin extending through the bore hole; a focus ring horizontally surrounding the wafer at the first position and extending upwardly from the base, wherein the wafer is configured to be moved vertically between the first position and a second position above the focus ring via the pin; and a slit valve above the focus ring, wherein the wafer is configured to be moved horizontally between the second position and the slit valve via a robotic arm.
Claims20
A system, comprising:
- a base with a bore hole, wherein the base is configured to secure a wafer at a first position on the base;
- a pin extending through the bore hole;
- a focus ring horizontally surrounding the wafer at the first position and extending upwardly from the base, wherein the wafer is configured to be moved vertically between the first position and a second position above the focus ring via the pin;
- and
- a slit valve above the focus ring, wherein the wafer is configured to be moved horizontally between the second position and the slit valve via a robotic arm.
A chamber, comprising:
- a base with a bore hole, wherein the base is configured to secure a wafer at a first position on the base;
- a pin configured to extend through the bore hole and retract into the bore hole;
- and
- a focus ring horizontally surrounding the wafer at the first position and extending upwardly from the base, wherein the focus ring is immovably secured to the base, and wherein the wafer is configured to be moved vertically between the first position and a second position above the focus ring via the pin.
A method, comprising:
- retrieving a wafer at a position above a focus ring, wherein the focus ring extends from a base;
- moving the wafer vertically through an inner annulus region, bounded by the focus ring, to rest on the base;
- processing the wafer resting on the base within the focus ring;
- and
- moving the wafer vertically through the inner annulus region of the focus ring to the position above the focus ring.
Dependencies are inferred from the claim text.