Substrate processing apparatus arranged in process chamber and operating method thereof

A substrate processing apparatus comprising:

• a disc provided so as to perform first rotation;
• at least one susceptor disposed on the disc such that a substrate is seated on an upper surface thereof, the susceptor being configured to perform the first rotation and to perform second rotation around a center of the disc as the disc performs the first rotation;
• a metal ring coupled to a lower portion of the susceptor, the metal ring being arranged such that a center thereof coincides with a center of the susceptor;
• a magnet provided below the metal ring so as to be opposite the metal ring in a vertical direction;
• and
• a support pole having one end coupled to a process chamber for supporting the magnet.

A substrate processing apparatus comprising:

• a disc provided so as to perform first rotation;
• at least one susceptor disposed on the disc such that a substrate is seated on an upper surface thereof, the susceptor being configured to perform the first rotation and to perform second rotation around a center of the disc as the disc performs the first rotation;
• a metal ring coupled to the susceptor;
• and
• a magnet spaced apart from the disc and the susceptor so as to be opposite the metal ring.