Apparatus and method for processing substrate

An apparatus for processing a substrate, the apparatus comprising:

• a liquid processing chamber configured to perform liquid processing on the substrate by supplying a processing liquid onto the substrate;
• a drying chamber configured to remove the processing liquid from the substrate;
• a transfer unit configured to transfer the substrate between the liquid processing chamber and the drying chamber;
• and
• a controller configured to control the liquid processing chamber, the drying chamber, and the transfer unit,
• wherein the liquid processing chamber comprises:
• a cup having a processing space inside;
• a support unit configured to support and rotate the substrate in the processing space;
• and
• a liquid supply unit configured to supply the processing liquid onto the substrate,
• wherein the drying chamber comprises:
• a body having an inner space inside;
• a support configured to support an edge region of the substrate in the inner space;
• a fluid supply unit configured to supply a fluid for drying into the inner space;
• and
• an exhaust unit configured to exhaust the fluid in the inner space, and
• wherein the controller is configured to control the liquid processing chamber, the drying chamber, and the transfer unit to sequentially perform a liquid processing step for performing liquid processing on the substrate by supplying the processing liquid onto the substrate in the liquid processing chamber, a transfer step for transferring the substrate from the liquid processing chamber to the drying chamber, and a drying step for drying the substrate in the drying chamber and to allow a height of the processing liquid remaining on the edge region of the substrate to be higher than a height of the processing liquid remaining on a central region of the substrate when the liquid processing is completed in the liquid processing chamber in the liquid processing step.

A method for processing a substrate, the method comprising:

• a liquid processing process of performing liquid processing on the substrate by supplying a processing liquid onto the substrate in a liquid processing chamber;
• a liquid level adjustment process of adjusting a level of the processing liquid remaining on the substrate after the liquid processing process;
• and
• a drying process of removing the processing liquid from the substrate,
• wherein the liquid level adjustment process is performed by rotating the substrate while the supply of the processing liquid onto the substrate is stopped.