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US 2019/0164769 A1Published application
Substrate cleaning device and substrate cleaning method
AssigneeEbara Corporation
InventorsShinji KAJITA, Hisajiro NAKANO, Tomoatsu ISHIBASHI, Koichi FUKAYA, Yasuyuki MOTOSHIMA, Yohei ETO, Fumitoshi OIKAWA
Life of this patent
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Abstract
An apparatus for cleaning a substrate has a holding unit 60 that holds a substrate W; a rotated unit 30 connected to the holding unit 60; a rotating unit 35 that is provided on a peripheral outer side of the rotated unit 30 and rotates the rotated unit 30; and a cleaning unit 10, 20 that physically cleans the substrate W held by the holding unit 60.
Claims20
An apparatus for cleaning a substrate comprising:
- a holding unit that holds the substrate;
- a rotated unit connected to the holding unit;
- a rotating unit that is provided on a peripheral outer side of the rotated unit and rotates the rotated unit;
- and
- a cleaning unit that physically cleans the substrate held by the holding unit.
2 more elements
A substrate cleaning method comprising the steps of:
- holding a substrate by a holding unit;
- rotating a rotated unit connected to the holding unit by a rotating unit provided on a peripheral outer side of the rotated unit;
- and
- physically cleaning the substrate being rotated by the rotating unit by a cleaning unit.
1 more element
Dependencies are inferred from the claim text.