Multi-state device based on ion trapping
AssigneeInternational Business Machines Corporation
InventorsNing Li, Yun Seog Lee, Joel P. de Souza, Devendra K. Sadana
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AssigneeInternational Business Machines Corporation
InventorsNing Li, Yun Seog Lee, Joel P. de Souza, Devendra K. Sadana
Estimating the term…
A semiconductor structure is provided that contains a non-volatile battery which controls gate bias and has increased output voltage retention and voltage resolution. The semiconductor structure may include a semiconductor substrate including at least one channel region that is positioned between source/drain regions. A gate dielectric material is located on the channel region of the semiconductor substrate. A battery stack is located on the gate dielectric material. The battery stack includes, a cathode current collector located on the gate dielectric material, a cathode material located on the cathode current collector, a first ion diffusion barrier material located on the cathode material, an electrolyte located on the first ion diffusion barrier material, a second ion diffusion barrier material located on the electrolyte, an anode region located on the second ion diffusion barrier material, and an anode current collector located on the anode region.
A semiconductor structure comprising:
A method of forming a semiconductor structure, the method comprising:
Dependencies are inferred from the claim text.