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US 2019/0164726 A1Published application
Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsGen TAMAMUSHI, Naoyuki SATOH, Akihiro YOKOTA, Shinji HIMORI
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Abstract
A plasma processing apparatus includes a processing chamber in which plasma is generated, and a protection target member which is provided in the processing chamber and needs to be protected from consumption by the plasma. The protection target member is made of a material having a property of integrating radicals and/or anions or a protective layer containing the material is provided on a surface of the protection target member.
Claims7
A plasma processing apparatus comprising:
- a processing chamber in which plasma is generated;
- and
- a protection target member which is provided in the processing chamber and needs to be protected from consumption by the plasma,
- wherein the protection target member is made of a material having a property of integrating radicals and/or anions or a protective layer containing the material is provided on a surface of the protection target member.
1 more element
Dependencies are inferred from the claim text.