X-Ray Micro-Beam Production and High Brilliance X-Ray Production

Abstract

An x-ray micro-beam radiation production system is provided having: a source of accelerated electrons, an electron focusing component configured to focus the electrons provided by the source, and a target which produces x-rays when electrons impinge thereon from the source. The electron focusing component is configured to focus the electrons provided by the source such that they impinge at a focal spot having a width δ formed on a surface of the target. The focusing component is configured to move the electron beam relative to the target such that the focal spot moves across the target surface in the width direction, and/or the target is movable relative to the focusing component such that the focal spot moves across the target surface in the width direction, the surface velocity of the focal spot across the target surface in the width direction being greater than vt where: formula (I), k, ρ and c denoting respectively the heat conductivity, the density and the heat capacity of the target material, and d denoting the electron penetration depth in the target material. v t = π   k 4  ρ   c · δ d 2 , ( I )

Dependencies are inferred from the claim text.