Generating compositional artifacts based on seed artifacts
AssigneeInternational Business Machines Corporation
InventorsAditya Vempaty, Richard B. Segal, Ashish Jagmohan, Richard T. Goodwin, Flavio du Pin Calmon
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Abstract
A compositional artifact may be identified, and a set of logical coordinates within a composition model may be determined for the compositional artifact. The set of logical coordinates may be determined based on the components of the compositional artifact. Tolerance parameters may be used in conjunction with the set of logical coordinates to calculate a logical distance, and other artifacts in the composition model whose logical coordinates fall within the logical distance may be displayed to a user.
Claims20
A method for using a composition model to generate compositional artifacts, the method comprising:
- identifying a first artifact;
- determining a first set of logical coordinates within the compositional artifact model for the first artifact;
- identifying a tolerance parameter;
- calculating, based on the first set of logical coordinates and the tolerance parameter, a logical distance from the first artifact;
- identifying a second artifact, the second artifact having a second set of logical coordinates within the logical distance from the first set of logical coordinates of the first artifact;
- and
- notifying a user of the second artifact.
A system for using a composition model to generate compositional artifacts, the system comprising:
- a memory;
- and
- a processor in communication with the memory, wherein the computer system is configured to perform a method, the method comprising:
- identifying a first artifact;
- determining a first set of logical coordinates within the compositional artifact model for the first artifact;
- identifying a tolerance parameter;
- calculating, based on the first set of logical coordinates and the tolerance parameter, a logical distance from the first artifact;
- identifying a second artifact, the second artifact having a second set of logical coordinates within the logical distance from the first set of logical coordinates of the first artifact;
- and
- notifying a user of the second artifact.
A computer program product for using a composition model to generate compositional artifacts, the computer program product comprising a computer readable storage medium having program instructions embodied therewith, the program instructions executable by a device to cause the device to perform a method, the method comprising:
- identifying a first artifact;
- determining a first set of logical coordinates within the compositional artifact model for the first artifact;
- identifying a tolerance parameter;
- calculating, based on the first set of logical coordinates and the tolerance parameter, a logical distance from the first artifact;
- identifying a second artifact, the second artifact having a second set of logical coordinates within the logical distance from the first set of logical coordinates of the first artifact;
- and
- notifying a user of the second artifact.
Dependencies are inferred from the claim text.