Optical mask validation

A method for ensuring semiconductor design integrity, the method comprising:

• analyzing one or more photomask designs for a semiconductor circuit, wherein the photomask design has an electrical design necessary for the operation of the semiconductor circuit, and white space, wherein the white space has no electrical design;
• and
• inserting an optical design into the white space of the one or more photomask designs for the semiconductor circuit, wherein the optical design has one or more known optical patterns for validating the semiconductor circuit design and wherein the optical design comprises one or more photomask layers and may overlay the electrical design.

A method for ensuring semiconductor design integrity, the method comprising:

• analyzing one or more photomask designs for a semiconductor circuit, wherein the photomask design has an electrical design necessary for the operation of the semiconductor circuit, and white space, wherein the white space has no electrical design;
• and
• inserting an optical design into the white space of the one or more photomask designs for the semiconductor circuit, wherein the optical design has one or more known optical patterns for validating the semiconductor circuit design and wherein the optical design comprises covershapes.

A method for ensuring semiconductor design integrity, the method comprising:

• analyzing one or more photomask designs for a plurality of semiconductor circuits, wherein the photomask design has an electrical design necessary for the operation of each one of the plurality semiconductor circuits, and white space between the designs for the plurality of semiconductor circuits, wherein the white space has no electrical design;
• and
• inserting an optical design into the white space of the one or more photomask designs for the semiconductor circuit, wherein the optical design has one or more known optical patterns for validating the semiconductor circuit design and wherein the optical design is physically isolated from the electrical design.

A semiconductor structure comprising:

• an electrical circuit necessary for the operation of the semiconductor circuit, and white space, wherein the white space has no electrical circuit;
• and
• an optical pattern formed in the white space of the electrical circuit, wherein the optical pattern is used for validating the semiconductor circuit design.