Metrology method in reticle transportation
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYao-Yuan SHANG, Kuo-Shu TSENG, Yen-Yu CHEN, Chun-Chih LIN, Yi-Ming DAI
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Abstract
A method for fault detection in a fabrication system is provided. The method includes transferring a reticle carrier containing a reticle from an original position to a destination position. The method further includes detecting environmental condition in the reticle carrier during the transfer of the reticle carrier using a metrology tool that is positioned at the reticle carrier. The method also includes issuing a warning when the detected environmental condition is outside a range of acceptable values.
Claims23
A method for fault detection in a fabrication system, comprising:
- transferring a reticle carrier by a transferring apparatus from an original position to a destination position, wherein the reticle carrier contains a reticle;
- detecting environmental condition in the reticle carrier during the transfer of the reticle carrier using a metrology tool that is positioned at the reticle carrier;
- and
- issuing a warning when the detected environmental condition is outside a range of acceptable values;
- and
- providing charging power to the reticle carrier by an interface device that is positioned at the transferring apparatus.
5-6. (canceled)
A method for fault detection in a fabrication system, comprising:
- transferring an inner pod of a reticle carrier out from an outer pod of the reticle carrier, wherein the inner pod contains a reticle in a lithography exposure apparatus;
- detecting environmental condition around the reticle using a metrology tool positioned in the inner pod during the transfer of the inner pod in the lithography exposure apparatus;
- and
- issuing a warning when the environmental condition is outside of a range of acceptable value.
(canceled)
A fabrication facility, comprising:
- a reticle carrier configured to receive a reticle for a lithography exposure process, wherein the reticle carrier comprises:
- an inner pod configured to receiving the reticle, wherein the first metrology tool is positioned in the inner pod;
- and
- an outer pod configured to receiving the inner pod;
- a first metrology tool positioned in the reticle carrier and configured to detect environmental condition in the reticle carrier;
- a second metrology tool positioned in the outer pod but outside the inner pod, wherein the second metrology tool is configured for detecting the environmental condition in the outer pod.
- a transferring apparatus configured to transfer the reticle carrier;
- and
- a control system configured to control the transferring apparatus to move the reticle carrier for maintenance when the environmental condition detected by one of the first metrology tool and the second metrology tool is outside a range of acceptable values.
(canceled)
Dependencies are inferred from the claim text.