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US 2019/0163058 A1Published application
Salts and photoresists comprising same
AssigneeRohm and Haas Electronic Materials LLC
InventorsEmad Aqad, James F. Cameron, James W. Thackeray
Life of this patent
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Abstract
New Te-salt compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.
Claims10
A salt of the following Formula (I):
- wherein, R1, R2 and R3 are each independently C6-60 aryl group, a C6-20 fluoroaryl group, a C1-20 heteroaryl group, a C7-20 aralkyl group, a C7-20 fluoroaralkyl group, a C2-20 heteroaralkyl group, or a C2-20 fluoroheteroaralkyl group C1-20 alkyl group, a C1-20 fluoroalkyl group, a C3-20 cycloalkyl group, a C3-20 fluorocycloalkyl group, a C2-20 alkenyl group, a C2-20 fluoroalkenyl group, each of which is substituted or unsubstituted,
- wherein each R1 is either separate or connected to R2 and/or R3 to form a ring, and
- Z comprises a counter anion.
Dependencies are inferred from the claim text.