Scanner based optical proximity correction system and method of use

Abstract

A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ1<ε1, wherein δ1 represents model vs. exposure difference and ε1 represents predetermined criteria. The technique further includes completing the model when δ1<ε1.

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