Optical Wavelength Dispersion Device and Manufacturing Method Therefor
OwnerCheng-Hao Koinventor
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Abstract
An optical wavelength dispersion device and manufacturing method therefor are disclosed, which the optical wavelength dispersion device includes a waveguide unit and a reflector, wherein the waveguide unit has a first substrate, an input unit, a grating and a second substrate. The input unit is formed on the first substrate and having a slit for receiving an optical signal, a grating is formed on the first substrate for producing an output beam once the optical signal is dispersed, the second substrate is located on the input unit and the grating, and forms a waveguide space with the first substrate, the reflector is located outside of the waveguide unit, and is used for change emitting angle of the output beam.
Claims10
An optical wavelength dispersion device, which is characterized by comprising:
- a waveguide unit, wherein the waveguide unit includes:
- a first substrate;
- an input unit, which is formed on the first substrate and having a slit for receiving an optical signal;
- a grating, which is formed on the first substrate, capable of producing an output beam once the optical signal has been dispersed;
- and
- a second substrate, which is located on the input unit and the grating, forming a waveguide space with the first substrate;
- wherein the input unit and the grating are formed by exposing a photoresist layer under a high energy light source, and the high energy light source has its wavelength ranging from 0.01 nm to 100 nm;
- and
- a reflector, which is located outside of the waveguide unit, being used for changing emitting angle of the output beam.
A manufacturing method of optical wavelength dispersion device, which is characterized by comprising the following steps:
- providing a first substrate;
- forming a photoresist layer on the first substrate;
- exposing the photoresist layer through a high energy light source mask by using a high energy light source, and the high energy light source has its wavelength ranging from 0.01 nm to 100 nm;
- developing the photoresist layer so as to form an input unit having a slit and a grating;
- using a second substrate to cover the input unit and the grating, thereby forming a waveguide unit;
- and
- allocating a reflector outside of the waveguide unit, wherein the reflector is used for changing emitting angle of an output beam from the grating.
Dependencies are inferred from the claim text.