Method of detecting a defect and apparatus for performing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHyon-Seok SONG, In-Yong KANG, Jong-Ju PARK
Life of this patent
Estimating the term…
Abstract
In a method of detecting a defect, a region of a substrate may be primarily scanned using a first electron beam to detect a first defect. A remaining region of the substrate, which may be defined by excluding a portion in which the first defect may be positioned from the region of the substrate, may be secondarily scanned using a second electron beam to detect a second defect. Thus, the portion with the defect may not be scanned in a following scan process so that a scanning time may be remarkably decreased.
Claims24
A method of detecting a defect, the method comprising:
- primarily scanning a region of a substrate using a first electron beam;
- detecting a first defect;
- secondarily scanning a first remaining region of the substrate using a second electron beam;
- and
- detecting a second defect, wherein the first remaining region of the substrate is defined by excluding a first portion in which the first defect is positioned from the region of the substrate.
(canceled)
(canceled)
A method for detecting a defect, the method comprising:
- scanning an entire region of a substrate using a preliminary electron beam;
- obtaining a preliminary image;
- applying a preliminary defect detection sensitivity to the preliminary image;
- dividing the entire region of the substrate into a patterned region and a non-patterned region;
- primarily scanning the patterned region of the substrate using a first electron beam;
- obtaining a first image;
- applying a first defect detection sensitivity to the first image, the first defect detection sensitivity higher than the preliminary defect detection sensitivity;
- detecting a first defect;
- secondarily scanning a first remaining region of the patterned region using a second electron beam, the first remaining region of the patterned region defined by excluding a first portion in which the first defect is positioned from the patterned region;
- obtaining a second image;
- applying a second defect detection sensitivity to the second image, the second defect detection sensitivity higher than the first defect detection sensitivity;
- and
- detecting a second defect.
22-33. (canceled)
A non-transitory, computer-readable medium comprising instructions which, when executed, cause a controller to control operations of:
- primarily scanning a region of a substrate using a first electron beam;
- detecting a first defect;
- secondarily scanning a first remaining region of the substrate using a second electron beam;
- and
- detecting a second defect, wherein the first remaining region of the substrate is defined by excluding a first portion in which the first defect is positioned from the region of the substrate.
35-38. (canceled)
Dependencies are inferred from the claim text.