Manufacturing method for deposition mask, metal plate used for producing deposition mask, and manufacturing method for said metal sheet

A manufacturing method for a deposition mask having a plurality of through-holes formed therein, the method comprising:

• a step of preparing a metal plate;
• a first resist pattern forming step of forming a first resist pattern on a first surface of the metal plate;
• and
• an etching step of etching an area of the first surface of the meal plate, the area being not covered with the first resist pattern, so that first recesses to define the through-holes are formed in the first surface of the metal plate;
• wherein:
• when a composition analysis of a first surface of the metal plate is performed by using an X-ray photoelectron spectroscopy, a ratio A1/A2 obtained by the result of the X-ray photoelectron spectroscopy is 0.4 or less, where A1 is a sum of a peak planar dimension value of nickel oxide and a peak planar dimension value of nickel hydroxide, and A2 is a sum of a peak planar dimension value of iron oxide and a peak planar dimension value of iron hydroxide;
• and
• in the composition analysis of the first surface of the metal plate by means of the X-ray photoelectron spectroscopy, an incident angle of an X-ray emitted to the metal plate on the first surface is 45 degrees, and an acceptance angle of photoelectrons discharged from the metal plate is 90 degrees.