Apparatus and method for producing alkaline water for cleaning electronic device
AssigneeNomura Micro Science Co., Ltd.
InventorTakayuki JIZAIMARU
Life of this patent
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Abstract
To provide method and apparatus for producing alkaline water, capable of preventing mixture of fine particles derived from a gas dissolving membrane device into hydrogen water. An apparatus for producing alkaline water for cleaning electronic device includes: a pH adjusting device 11 configured to adjust ultrapure water to be alkaline; a deaeration device 13 configured to deaerate the ultrapure water adjusted to be alkaline; and a gas dissolving membrane device 14 having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.
Claims17
An apparatus for producing alkaline water for cleaning electronic device, the apparatus comprising:
- a supplier of pH regulator to adjust ultrapure water to be alkaline;
- a dearator to deaerate the ultrapure water adjusted to be alkaline;
- and
- a gas dissolver having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.
An apparatus for producing alkaline water for cleaning electronic device, the apparatus comprising:
- a pH adjusting device configured to adjust ultrapure water to be alkaline;
- a deaeration device configured to deaerate the ultrapure water adjusted to be alkaline;
- and
- a gas dissolving membrane device having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.
A method for producing alkaline water for cleaning electronic device, the method comprising:
- adjusting a liquidity of ultrapure water to be alkaline;
- deaerating the ultrapure water adjusted to be alkaline;
- and
- dissolving functional gas into the deaerated ultrapure water.
Dependencies are inferred from the claim text.