Method of manufacturing inkjet head substrate
AssigneeCanon Kabushiki Kaisha
InventorsTakayuki Kamimura, Masataka Kato, Hiroshi Higuchi, Atsunori Terasaki, Shuichi Tamatsukuri
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AssigneeCanon Kabushiki Kaisha
InventorsTakayuki Kamimura, Masataka Kato, Hiroshi Higuchi, Atsunori Terasaki, Shuichi Tamatsukuri
Estimating the term…
A method of manufacturing an inkjet head substrate is provided. The inkjet head substrate includes an ink supply port having a through portion and a non-through portion, and the non-through portion is disposed at a position closer than the through portion to the energy generating element. The method includes disposing a mask having an opening that has a relatively large opening-width portion and a relatively small opening-width portion. The method also includes forming the through portion in the substrate at a position corresponding to the relatively large opening-width portion and the non-through portion in the substrate at a position corresponding to the relatively small opening-width portion by performing reactive ion etching on the substrate through the opening of the mask in one operation.
A method of manufacturing an inkjet head substrate that includes
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