Process for forming inkjet nozzle chambers

Abstract

A process for forming an inkjet chamber over a hole defined in a frontside surface of a wafer substrate. The process includes the steps of: (i) laminating a layer of dry film photoresist onto the frontside surface; (ii) defining wall openings corresponding to chamber walls in the dry film photoresist; (iii) depositing chamber material into the wall openings and over the dry film photoresist so as to form chamber walls and a chamber roof; (iv) defining a nozzle opening in the chamber roof; and (v) removing the dry film photoresist to form the inkjet chamber over the hole.

Dependencies are inferred from the claim text.