Chamber apparatus, target generation method, and euv light generation apparatus

A target generation method using a chamber apparatus, the chamber apparatus including:

• a chamber;
• a target generation device assembled with the chamber, configured to supply tin as a target material to a certain region in the chamber, and including
• 1. a tank part configured to store tin,
• 2. a variable temperature device configured to change a temperature of the tin in the tank part,
• 3. a pressure regulator configured to change a pressure in the tank part, and
• 4. a nozzle part having a nozzle hole configured to eject liquefied tin;
• a gas source configured to supply gas containing hydrogen gas into the chamber;
• an evacuation device configured to evacuate gaseous body in the chamber;
• and
• a controller configured to control generation of a target, to supply tin to the certain region in the chamber, the method comprising controlling, by the controller:
• A. the evacuation device to maintain an oxygen partial pressure in the chamber at 4×10−5 Pa or lower;
• B. the variable temperature device to melt the tin;
• C. the pressure regulator to eject the molten tin from the nozzle hole, and
• D. the gas source to supply the gas containing hydrogen gas into the chamber after the ejection.

An extreme ultraviolet (EUV) light generation apparatus comprising:

• a chamber;
• a target generation device assembled with the chamber, configured to supply tin as a target material to a certain region in the chamber, and including
• 1. a tank part configured to store tin,
• 2. a variable temperature device configured to change a temperature of the tin in the tank part,
• 3. a pressure regulator configured to change a pressure in the tank part, and
• 4. a nozzle part having a nozzle hole configured to eject liquefied tin;
• a gas source configured to supply gas containing hydrogen gas into the chamber;
• an evacuation device configured to evacuate gaseous body in the chamber;
• a controller configured to control generation of a target and to control
• A. the evacuation device to maintain an oxygen partial pressure in the chamber at 4×10−5 Pa or lower,
• B. the variable temperature device to melt the tin,
• C. the pressure regulator to eject the molten tin from the nozzle hole, and
• D. the gas source to supply the gas containing hydrogen gas into the chamber after the ejection;
• a laser device configured to emit a laser beam to the tin supplied into the chamber;
• and
• a light collection mirror configured to collect EUV light radiated from plasma of the tin generated by irradiating the tin with the laser beam and output the collected EUV light.