Twin gate field effect diode

Abstract

A semiconductor diode including a first conductivity type region on an upper surface of a semiconductor substrate, a fin structure atop the first conductivity type region providing a vertically orientated semiconductor base region, and a second conductivity type region at a second end of the fin structure opposite a first end of the fin structure that is in contact with the first conductivity type region. The semiconductor diode may also include a vertically orientated dual gate that is present around the fin structure. The vertically orientated dual gate including a first gate structure that is present abutting the semiconductor substrate and a second gate structure that is in closer proximity to the second conductivity type region than the first conductivity type region. The first gate structure separated from the second gate structure by a dielectric inter-gate spacer.

Dependencies are inferred from the claim text.