Method of Manufacturing a Semiconductor Device Having an Undulated Profile of Net Doping in a Drift Zone

Abstract

A method of manufacturing a semiconductor device includes forming a profile of net doping in a drift zone of a semiconductor body by multiple irradiations with protons and generating hydrogen-related donors by annealing the semiconductor body. At least 50% of a vertical extension of the drift zone between first and second sides of the semiconductor body is undulated and includes multiple doping peak values between 1×1013 cm−3 and 5×1014 cm−3.

Dependencies are inferred from the claim text.