Method and assembly for ohmic contact in thinned silicon carbide devices
AssigneeMicrosemi Corporation
InventorsBruce Odekirk, Jacob Alexander Soto
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AssigneeMicrosemi Corporation
InventorsBruce Odekirk, Jacob Alexander Soto
Estimating the term…
A silicon carbide semiconductor assembly and a method of forming a silicon carbide (SiC) semiconductor assembly are provided. The silicon carbide semiconductor assembly includes a semiconductor substrate and an electrode. The semiconductor substrate is formed of silicon carbide and includes a first surface, a second surface opposing the first surface, and a thickness extending therebetween. The method includes forming one or more electronic devices on the first surface and thinning the semiconductor substrate by removing the second surface to a predetermined depth of semiconductor substrate and leaving a third surface opposing the first surface. The method further includes forming a non-ohmic alloy layer on the third surface at a first temperature range and annealing the alloy layer at a second temperature range forming an ohmic layer, the second temperature range being greater than the first temperature range.
A method of forming a silicon carbide (SiC) semiconductor assembly that includes a semiconductor substrate and an electrode, the semiconductor substrate formed of silicon carbide and having a first surface, a second surface opposing the first surface, and a thickness extending therebetween, said method comprising:
A method of forming a semiconductor assembly, said method comprising:
A silicon carbide semiconductor assembly comprising:
Dependencies are inferred from the claim text.