Manufacture method of array substrate, array substrate, and display apparatus
AssigneesBoe Technology Group Co., Ltd., Hefei Boe Optoelectronics Technology Co., Ltd.
InventorsZhaofan Liu, Yijun Wang, Na Zhao, Qiyu Shen
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Abstract
There is provided a manufacture method of an array substrate of a display device using TFT as a pixel control unit, an array substrate, and a display apparatus. In this method, when a data line and source and drain electrodes of a TFT are prepared, a half-tone mask is used to retain at least one part of a photoresist on the data line; and the retained photoresist is softened by heating so that the at least one part of the data line is coated by the retained photoresist.
Claims14
A manufacture method of an array substrate of a display device using thin-film transistor (TFT) as a pixel control unit, the manufacture method comprising:
- forming a conductive material layer;
- covering the conductive material layer with a photoresist layer;
- exposing the photoresist layer by using a half-tone mask plate;
- developing the photoresist layer after exposure to form a photoresist complete retention area, a photoresist partial retention area, and a photoresist complete removal area;
- etching the conductive material layer in the photoresist complete removal area to form a data line, a source electrode, and a drain electrode of the TFT, wherein at least one part of the data line lies in the photoresist complete retention area, and at least one part of the source electrode and the drain electrode lies in the photoresist partial retention area;
- removing the photoresist in the photoresist partial retention area while retaining at least one part of the photoresist in the photoresist complete retention area;
- and
- softening the retained photoresist by heating so that the at least one part of the data line is coated by the retained photoresist.
Dependencies are inferred from the claim text.