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US 2019/0157130 A1Published application
Support unit and substrate treating apparatus comprising the same
AssigneeSemes Co., Ltd.
InventorsSEUNG PYO LEE, HYUNG JOON KIM
Life of this patent
Estimating the term…
Abstract
Disclosed are a support unit and a substrate treating apparatus comprising the same. The inventive concept provides a support unit that may prove temperature uniformity between facing areas on a substrate the other areas of the substrate and may solve a problem of not easily separating a substrate by a negative pressure in a pin hole when the substrate is separated from the support unit, and a substrate treating apparatus.
Claims12
A substrate treating apparatus comprising:
- a chamber providing a treatment space to the interior of the substrate treating apparatus;
- a support unit located in the treatment space and on which a substrate is positioned;
- a gas supply unit configured to eject a process gas into the treatment space;
- and
- a plasma generating unit configured to generate plasma from the process gas,
- wherein the support unit comprises:
- a gas line formed in the support unit to supply a heat transfer gas between the substrate positioned on the support unit and the support unit;
- a lift pin configured to elevate through a pin hole formed in the support unit and configured to deliver the substrate to the support unit or receive the substrate from the support unit;
- and
- a supply line configured to supply a gas to the pin hole.
7 more elements
A support unit that supports a substrate, the support unit comprising:
- a gas line formed in the support unit to supply a heat transfer gas between a bottom surface of the substrate positioned on the support unit and an upper surface of the support unit;
- a lift pin configured to elevate through a pin hole formed in the support unit and configured to deliver the substrate to the support unit or receive the substrate from the support unit;
- and
- a supply line configured to supply a gas to the pin hole.
1 more element
Dependencies are inferred from the claim text.