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US 2019/0157116 A1Published application
Spin coater and substrate treating apparatus and system having the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHYUN-JOO JEON, SUNG-HYUP KIM
Life of this patent
Estimating the term…
Abstract
A spin coater includes a rotatable chuck structure configured to hold a substrate, a bowl enclosing the substrate and guiding a flow of a fluid around the substrate to a bottom of the bowl, and a flow controller detachably coupled to the bowl such that the flow controller is arranged between the bowl and an edge of the substrate and separates the flow into a linear flow and a non-linear flow.
Claims21
A spin coater comprising:
- a rotatable chuck structure configured to hold a substrate;
- a bowl enclosing the rotatable chuck structure, the bowl configured to guide a flow of a fluid around the substrate to a bottom of the bowl;
- and
- a flow controller detachably coupled to the bowl, wherein the flow controller is arranged between the bowl and an edge of the substrate and separates the flow into a linear flow and a non-linear flow.
1 more element
An apparatus for treating substrates, comprising:
- a housing having a gate configured to receive a substrate;
- a flow generator arranged at a ceiling of the housing and generating an air flow descending from the ceiling to a bottom of the housing;
- a chemical supplier configured to supply chemicals onto the substrate;
- and
- a spin coater secured to the bottom of the housing, the spin coater configured to coat the chemicals on the substrate,
- wherein the spin coater comprises:
- a rotatable chuck structure configured to hold the substrate;
- a bowl enclosing the substrate and configured to guide a chemical flow of the chemicals and the air flow around the substrate to a bottom of the bowl;
- and
- a flow controller detachably coupled to the bowl such that the flow controller is arranged between the bowl and an edge of the substrate, wherein the flow controller separates the chemical flow and the air flow into a linear flow and a non-linear flow.
7 more elements
17-20. (canceled)
A spin coater comprising:
- a rotatable chuck structure configured to hold a substrate;
- a bowl enclosing the rotatable chuck structure;
- a first ring detachably coupled to an upper portion of the bowl;
- a second ring enclosing the rotatable chuck structure;
- and
- a connector connecting the second ring to the first ring.
3 more elements
Dependencies are inferred from the claim text.