Flexible display screen structure and manufacturing method thereof

A manufacturing method of a flexible display screen structure, comprising the following steps:

• Step S1:
• providing a flexible substrate, and conducting, in sequence, coating and setting a buffer layer on the flexible substrate, forming a patterned semiconductor active layer on each of areas in which a first display zone and a second display zone are to be formed, and sequentially coating and stacking a plurality of inorganic insulation layers on the semiconductor active layer and the buffer layer;
• Step S2:
• using one mask to form metal wire laying layers, such that the metal wire laying layers are in contact with the semiconductor active layers respectively;
• Step S3:
• using another mask to remove a portion of the metal wire laying layers in an area where an outward curving zone is to be formed and at least one of the inorganic insulation layers located thereunder;
• Step S4:
• coating and filling an organic material in the area where the outward curving zone is to be formed to form a third flexible organic layer;
• Step S5:
• using a further mask to form a metallic connection line in the area where the outward curving zone is to be formed to connect between the metal wire laying layers of the first display zone and the second display zone;
• Step S6:
• coating and setting a first flexible organic layer on the metallic connection line, the metal wire laying layers, and a third one of the inorganic insulation layers;
• Step S7:
• forming an anode on the first flexible organic layer in each of the areas where the first display zone and the second display zone are to be formed;
• wherein the anodes are respectively in contact with the metal wire laying layers and the semiconductor active layers, the metal wire laying layers, and the anodes constitute array pixel circuits respectively;
• and
• Step S8:
• forming a second flexible organic layer on the anodes and the first flexible organic layer;
• wherein the second flexible organic layer is arranged to expose portions of the anodes.

A manufacturing method of a flexible display screen structure, comprising the following steps:

• Step S1:
• providing a flexible substrate, and conducting, in sequence, coating and setting a buffer layer on the flexible substrate, forming a patterned semiconductor active layer on each of areas in which a first display zone and a second display zone are to be formed, and sequentially coating and stacking a plurality of inorganic insulation layers on the semiconductor active layer and the buffer layer;
• Step S2:
• using one mask to form metal wire laying layers, such that the metal wire laying layers are in contact with the semiconductor active layers respectively;
• Step S3:
• using another mask to remove a portion of the metal wire laying layers in an area where an outward curving zone is to be formed and at least one of the inorganic insulation layers located thereunder;
• Step S4:
• coating and filling an organic material in the area where the outward curving zone is to be formed to form a third flexible organic layer;
• Step S5:
• using a further mask to form a metallic connection line in the area where the outward curving zone is to be formed to connect between the metal wire laying layers of the first display zone and the second display zone;
• Step S6:
• coating and setting a first flexible organic layer on the metallic connection line, the metal wire laying layers, and a third one of the inorganic insulation layers;
• Step S7:
• forming an anode on the first flexible organic layer in each of the areas where the first display zone and the second display zone are to be formed;
• wherein the anodes are respectively in contact with the metal wire laying layers and the semiconductor active layers, the metal wire laying layers, and the anodes constitute array pixel circuits respectively;
• and
• Step S8:
• forming a second flexible organic layer on the anodes and the first flexible organic layer;
• wherein the second flexible organic layer is arranged to expose portions of the anodes;
• wherein the flexible substrate is formed of a material comprising polyimide;
• and
• wherein each of the first flexible organic layer, the second flexible organic layer and the third flexible organic layer is formed of a material comprising organic photoresist.