Apparatus and method for cleaning reticle stage
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYu-Fu LIN, Tung-Jung CHANG, Chia-Chen CHEN
Life of this patent
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Abstract
An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.
Claims20
An apparatus for lithography comprising:
- a chamber providing a low-pressure environment and having a gas flow controller configured to enable pressurizing or depressurizing the chamber;
- an electrostatic reticle holder disposed in the chamber, the electrostatic reticle holder configured to secure a reticle;
- and
- an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder,
- wherein the ultrasound waves are configured to dislodge particulate matter from the electrostatic reticle holder.
A method of cleaning an electrostatic reticle holder used in a lithography system, the method comprising:
- pressurizing or depressurizing a chamber of the lithography system, the electrostatic reticle holder being disposed in a space enclosed by the chamber;
- and
- applying ultrasound waves to the electrostatic reticle holder during the pressurizing or depressurizing of the chamber, wherein the ultrasound waves are configured to dislodge particulate matter from the electrostatic reticle holder.
An apparatus for cleaning an electrostatic reticle holder used in a lithography system, the apparatus comprising:
- a chamber for providing a low pressure environment for the electrostatic reticle holder;
- an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder;
- a controller configured to control the ultrasound transducer;
- and
- a gas flow controller,
- wherein the gas flow controller is configured to enable pressurizing or depressurizing the chamber.
Dependencies are inferred from the claim text.