Exposure apparatus, exposure method, and method for producing device

Abstract

An exposure apparatus includes (i) a projection optical system, (ii) a substrate stage having a substrate holder on which a substrate is held, which is movable while holding the substrate with the substrate holder, and (iii) a reference member having a first reference and a second reference for performing an alignment process, the reference member being provided on the substrate stage. At least part of an upper surface of the reference member includes a liquid repellent material. The substrate is aligned based on information obtained from the alignment process. The substrate is exposed through liquid in a liquid immersion area formed locally on an upper surface of the substrate.

Dependencies are inferred from the claim text.