Method of forming a directed self-assembled layer on a substrate
AssigneesASM IP Holding B.V., Imec Vzw
InventorsWerner Knaepen, Jan Willem Maes, Maarten Stokhof, Roel Gronheid, Hari Pathangi Sriraman
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Abstract
A method of forming a directed self-assembled (DSA) layer on a substrate by: providing a substrate; applying a layer comprising a self-assembly material on the substrate; and annealing of the self-assembly material of the layer to form a directed self-assembled layer by providing a controlled temperature and gas environment around the substrate. The controlled gas environment comprises molecules comprising an oxygen element with a partial pressure between 10-2000 Pa.
Claims21
A method of forming a directed self-assembled (DSA) layer on a substrate comprising:
- providing a substrate;
- applying a layer comprising a self-assembly material on the substrate;
- and
- annealing the self-assembly material of the layer to form a directed self-assembled layer by providing a controlled temperature and gas environment around the substrate, wherein the method comprises controlling the controlled gas environment to comprise molecules comprising an oxygen element with a partial pressure between 10-2000 Pa.
An apparatus constructed and arranged to form a directed self-assembled (DSA) layer on a substrate, the apparatus comprising:
- a reaction chamber, the reaction chamber constructed and arranged to hold the substrate;
- a heating element configured to perform an annealing of the layer on the substrate;
- and
- a gas control system to control the gas environment around the substrate in the reaction chamber, wherein the method comprises controlling the controlled gas environment to comprise molecules comprising an oxygen element with a partial pressure between 10-2000 Pa.
Dependencies are inferred from the claim text.