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US 2019/0155155 A1Published application
Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Masaki Ohashi
Life of this patent
Estimating the term…
Abstract
A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
Claims16
A resist composition comprising a base polymer and a sulfonium salt having the formula (A):
- wherein R1 is hydroxyl,
- X is a single bond,
- R2, R3 and R4 are each independently fluorine, chlorine, bromine, iodine, or a C1-C12 straight, branched or cyclic alkyl group which may contain an oxo moiety, a C2-C12 straight, branched or cyclic alkenyl group which may contain an oxo moiety, C6-C20 aryl group, C7-C12 aralkyl group or C7-C12 aryloxyalkyl group, in which at least one hydrogen may be substituted by a hydroxy, carboxy, halogen, cyano, amide, nitro, sultone, sulfone or sulfonium salt-containing moiety, or in which an ether, ester, carbonyl, carbonate or sulfonic acid ester moiety may intervene between carbon atoms, or R2 and R3 may bond together to form a ring with the sulfur atom to which they are attached,
- m is an integer of 1 to 5, n is an integer of 1 to 3, and p is an integer of 1 to 3.
1 more element
A sulfonium salt having the formula (A-1):
- wherein R1′ is hydroxyl, R2′, R3′ and R4′ are each independently a C1-C12 straight, branched or cyclic alkyl group which may contain an oxo moiety, a C2-C12 straight, branched or cyclic alkenyl group which may contain an oxo moiety, C6-C20 aryl group, C7-C12 aralkyl group or C7-C12 aryloxyalkyl group, in which at least one hydrogen may be substituted by a hydroxy, carboxy, halogen, cyano, amide, nitro, sultone, sulfone or sulfonium salt-containing moiety, or in which an ether, ester, carbonyl, carbonate or sulfonic acid ester moiety may intervene between carbon atoms, or R2′ and R3′ may bond together to form a ring with the sulfur atom to which they are attached.
Dependencies are inferred from the claim text.