Apparatus and method for developing a photoresist coated substrate

An apparatus, comprising:

• a developing tank having a sidewall and a bottom,
• wherein the bottom has a plurality of holes formed in an internal surface of the bottom;
• a plurality of valves,
• wherein each of the plurality of valves is configured to open and close one of the plurality of holes;
• a plurality of fluid inlets connected to each of the plurality of holes;
• and
• a controller configured to individually control each of the plurality of valves, thereby allowing a fluid to flow through the hole when the hole is open, and block fluid flow when the hole is closed.

A method, comprising:

• inserting a patternwise exposed photoresist coated substrate into a developer in a developing tank, wherein the photoresist is coated on a first main surface of the substrate;
• wherein the developing tank has a plurality of holes in a bottom interior surface of the tank through which developer flows, and
• wherein the photoresist coated first main surface of the substrate faces the plurality of holes during development;
• and
• developing the photoresist to form a pattern in the photoresist.