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US 2019/0155141 A1Published application
Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing method
AssigneeHoya Corporation
InventorsKazuhiro HAMAMOTO, Yoichi Usui
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Abstract
A conductive film coated substrate, including a conductive film formed thereon. In a relationship between a bearing area (%) and a bearing depth (nm) that are obtained by measuring, with an atomic force microscope, a region of 1 μm×1 μm of a surface of the conductive film, the surface of the conductive film satisfies a relationship that (BA70−BA30)/(BD70−BD30) is 15 or more and 260 or less (%/nm), and a maximum height (Rmax) is 1.3 nm or more and 15 nm or less.
Claims11
A conductive film coated substrate comprising:
- a substrate for a mask blank for use in lithography;
- and
- a conductive film formed on one main surface of the substrate;
- wherein, in a frequency distribution chart where a relationship between a bearing depth obtained by measuring, with an atomic force microscope, a region of 1 μm×1 μm of a surface of the conductive film and a frequency (%) of the bearing depth is plotted, an absolute value of a bearing depth corresponding to a center of a full width at half maximum, which is determined from an approximated curve drawn through the plotted points or a highest frequency of the plotted points, is equal to or larger than an absolute value of the bearing depth corresponding to ½ of a maximum height (Rmax) of surface roughness of the surface of the conductive film, and the maximum height (Rmax) is 1.3 nm or more and 15 nm or less.
1 more element
Dependencies are inferred from the claim text.