Displacement sensor device and system

An apparatus, comprising:

• a first device, comprising
• a first spring configured to allow movement in a first direction parallel to a first surface and a second surface;
• and
• a first extension overlying and extending away from the first spring, the first extension including:
• the first surface, comprising an at least partially transparent surface with a first reflective diffraction pattern;
• and
• the second surface positioned below and parallel to the first surface and comprising a second reflective diffraction pattern;
• wherein the first and second diffraction patterns constitute a pattern pair, are separated by a chosen distance, and are configured to diffract light within a chosen range of wavelengths;
• and
• a second device, comprising:
• a second spring configured to allow movement in a direction parallel to the first and second surfaces and perpendicular to the first direction;
• and
• a second extension overlying and extending away from the second spring, the second extension including a second pattern pair;
• and
• a third device, comprising:
• a third spring configured to allow movement perpendicular to the first and second directions;
• and
• a third extension overlying and extending away from the third spring, the third extension including a third pattern pair;
• and
• wherein the first, second, and third extension structures end in a same area.

A method for measuring displacement, comprising:

• diffracting, via a first and a second diffraction pattern, light within a chosen range of wavelengths, wherein the first reflective diffraction pattern is on a first at least partially transparent plane surface and the second reflective diffraction pattern is on a second plane surface, wherein the second surface is positioned below and parallel to the first surface, and wherein the first and second diffraction patterns constitute a first pattern pair;
• diffracting, via a second pattern pair placed on the first and second surfaces, light within the chosen range of wavelengths;
• allowing movement of the first and second pattern pairs in at least two directions in-plane with the first and second surfaces;
• and
• providing sensitivity to the movement via the first and second pattern pairs having at least partially directional features having different orientations, wherein the first and second diffraction patterns are separated by a chosen distance.