Substrate mounting table
AssigneeTokyo Electron Limited
InventorsKohichi SATOH, Hideaki YAMASAKI, Motoko NAKAGOMI, Junya OKA
Life of this patent
Estimating the term…
Abstract
There is provided a substrate mounting table for use in a plasma-based processing apparatus that performs a plasma-based process on a substrate inside a processing container, which includes a substrate mounting portion having a front surface subjected to a mirroring treatment and on which the substrate is mounted, and an edge portion located around the substrate mounting portion and treated to have an uneven shape.
Claims7
A substrate mounting table for use in a plasma-based processing apparatus that performs a plasma-based process on a substrate inside a processing container, comprising:
- a substrate mounting portion having a front surface subjected to a mirroring treatment and on which the substrate is mounted;
- and
- an edge portion located around the substrate mounting portion and treated to have an uneven shape.
Dependencies are inferred from the claim text.