Imidazoyl urea polymers and their use in metal or metal alloy plating bath compositions
AssigneeAtotech Deutschland GmbH
InventorsHeiko BRUNNER, Lars KOHLMANN, Agnieszka WITCZAK, Olivier MANN
Life of this patent
Estimating the term…
Abstract
The present invention relates to imidazoyl urea polymers and their use in aqueous acidic plating baths for metal or metal alloy deposition such as electrolytic deposition of copper or alloys thereof in the manufacture of printed circuit boards, IC substrates, semiconducting and glass devices for electronic applications. The plating bath according to the present invention comprises at least one source of metal ions and an imidazoyl urea polymer. The plating bath is particularly useful for filling recessed structures and build-up of pillar bump structures.
Claims20
An imidazoyl urea polymer comprising a polymeric building block according to formula (I)
- wherein A represents a unit of the following formulae (A1) and (A2)
- wherein
- X is a divalent residue selected from the group consisting of
- wherein Z is selected from —CH2—, O, S;
- z and z′ are integers independently ranging from 1 to 6, R and R′ are monovalent residues each selected independently from the group consisting of hydrogen, alkyl, aryl, aralkyl and —CH2—CH2—(OCH2CH2)y—OH wherein y is an integer from 1 to 4;
- R1 and R2 are divalent residues each selected independently from the group consisting of —(CH2)b— and —(CH2)c—[CH(R4)—CH2—O]d—(CH2)e— wherein b is an integer ranging from 2 to 12;
- wherein c is an integer ranging from 0 to 3;
- d is an integer ranging from 1 to 100;
- e is an integer ranging from 1 to 3;
- each R4 is independently from each other selected from the group consisting of alkyl, aryl and hydrogen;
- R3 is a divalent residue which is selected from the group consisting of alkylene, arylene and —(CH2)f—[CH(R5)—CH2—O]g—(CH2)h—, wherein f is an integer ranging from 0 to 3;
- g is an integer ranging from 1 to 100;
- h is an integer ranging from 1 to 3;
- each R5 is independently from each other selected from the group consisting of alkyl, aryl and hydrogen;
- a is an integer and ranges from 1 to 40;
- and
- D is a divalent residue and is selected from the group consisting of —CH2—CH(OH)—CH2—, —CH2—CH(SH)—CH2—, —(CH2)i—[CH(R6)—CH2—O]j—(CH2)k— and —CH2—CH(OH)—(CH2)l—[CH(R7)—CH2—O]m—(CH2)n—CH(OH)—CH2—
- wherein i is an integer ranging from 0 to 3;
- j is an integer ranging from 1 to 100;
- k is an integer ranging from 1 to 3;
- each R6 is independently from each other selected from the group consisting of alkyl, aryl and hydrogen;
- l is an integer ranging from 1 to 3;
- m is an integer ranging from 1 to 100;
- n is an integer ranging from 1 to 3;
- each R7 is independently from each other selected from the group consisting of alkyl, aryl and hydrogen;
- wherein the individual units A may be the same or different, and
- wherein the individual units D may be the same or different.
A monomer urea compound of the following formulae (A1′) and (A2′)
- wherein X′ is a monovalent residue selected from the group consisting of
- wherein Z′ is selected from —CH2—, O, S, z″ and z′″ are integers independently ranging from 1 to 6;
- R″ and R′″ are monovalent residues each selected independently from the group consisting of hydrogen, alkyl, aryl, aralkyl and —CH2—CH2—(OCH2CH2)y′—OH wherein y′ is an integer from 1 to 4;
- R1′ and R2′ are divalent residues each selected independently from the group consisting of —(CH2)b′—, wherein b′ is an integer from 2 to 12, and —(CH2)c′—[CH(R4′)—CH2—O]d′—(CH2)e′—, wherein c′ is an integer ranging from 0 to 3;
- d′ is an integer ranging from 1 to 100;
- e′ is an integer ranging from 1 to 3;
- each R3′ is independently from each other selected from the group consisting of alkyl, aryl and hydrogen;
- R3′ is a divalent residue which is selected from the group consisting of alkylene, arylene and —(CH2)f′—[CH(R5′)—CH2—O]g′—(CH2)h′—, wherein f′ is an integer ranging from 0 to 3;
- g′ is an integer ranging from 1 to 100;
- h′ is an integer ranging from 1 to 3;
- each R5′ is independently from each other selected from the group consisting of alkyl, aryl and hydrogen.
Dependencies are inferred from the claim text.