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US 2019/0125781 A1Published application
Compositions and Methods to Affect Skin Irritation
AssigneesAlumend, LLC, Wavepharma, LLC
InventorsRonald E. Utecht, Therese M. Downey, Miri Seiberg, Stanley S. Shapiro, Jack V. Foster, JR.
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Abstract
Compositions are described that contain treated chitosan, modified chitosan and/or modified and treated chitosan for use in formulations for skin, hair and nails, and in compositions and methods of reducing topical agent-induced skin irritation and inflammation.
Claims9
A composition comprising:
- (a) at least one topical irritating agent comprising sodium dodecyl sulfate (SDS), and
- (b) at least one chitosan covalently modified with octane sulfonic acid via sulfonamide linkage (OsC), and wherein the composition provides a reduction in skin irritation and/or a reduction in skin inflammation and/or a reduction in irritant-induced IL-lot secretion after contact with the composition compared with a control composition comprising the topical irritating agent but not the chitosan.
Dependencies are inferred from the claim text.