Back to results
US 2019/0119423 A1Published application
Polishing composition for magnetic disk substrate
AssigneeYamaguchi Seiken Kogyo Co., Ltd.
InventorToru IWATA
Life of this patent
Estimating the term…
Abstract
Embodiments relate to a polishing composition is an aqueous composition containing at least colloidal silica, wet-process silica particles, and a water-soluble polymer compound. The water-soluble polymer compound is a copolymer containing a monomer having a carboxylic acid group, a monomer having an amide group, and a monomer having a sulfonic acid group as essential monomers.
Claims13
A polishing composition for a magnetic disk substrate, comprising:
- colloidal silica;
- pulverized wet-process silica particles;
- a water-soluble polymer compound;
- and
- water,
- wherein the water-soluble polymer compound is a copolymer containing a monomer having a carboxylic acid group, a monomer having an amide group, and a monomer having a sulfonic acid group as essential monomers.
3 more elements
Dependencies are inferred from the claim text.