Method for forming at least one electrical discontinuity in an integrated circuit, and corresponding integrated circuit
AssigneeSTMicroelectronics (Rousset) SAS
InventorsChristian RIVERO, Pascal FORNARA, Guilhem BOUTON, Mathieu LISART
Life of this patent
Estimating the term…
Abstract
An integrated circuit includes a semiconductor substrate and a multitude of electrically conductive pads situated between component zones of the semiconductor substrate and a first metallization level of the integrated circuit, respectively. The multitude of electrically conductive pads are encapsulated in an insulating region and include: first pads, in electrical contact with corresponding first component zones, and at least one second pad, not in electrical contact with a corresponding second component zone.
Claims13
A method, comprising:
- producing, above a semiconductor substrate and encapsulated in an insulating region, a multitude of electrically conductive pads situated between source-drain regions of the integrated circuit and a first metallization level of the integrated circuit, respectively;
- wherein producing includes:
- electrically connecting first pads of said multitude of pads with a corresponding first source-drain regions;
- and
- insulating at least one second pad from electrical contact with a corresponding second source-drain region so as to form said at least one electrical discontinuity.
A method, comprising:
- forming source-drain regions in a semiconductor substrate;
- forming a first metallization level on the semiconductor substrate;
- forming a plurality of electrically conductive pads between the source-drain regions and the first metallization level;
- encapsulating the plurality of electrically conductive pads with an insulating region;
- electrically connecting a first pad of the plurality of electrically conductive pads to a corresponding first source-drain region;
- and
- insulating a second pad of the plurality of electrically conductive pads from a corresponding second source-drain region so as to form at least one electrical discontinuity.
Dependencies are inferred from the claim text.