Methods of forming semiconductor devices

A method of forming a semiconductor device, the method comprising:

• forming lines of a photoresist material on a semiconductor device, each line of the photoresist material comprising a widened portion relative to other portions of the respective line of photoresist material;
• forming spacers on sidewalls of the lines of the photoresist material;
• removing the lines of the photoresist material;
• removing portions of a sacrificial material and an oxide material through openings between the spacers;
• removing the spacers and the sacrificial material and leaving first loops of the oxide material;
• forming a nitride material over oxide material and forming another oxide material over the nitride material;
• removing a portion of the nitride material to form second loops comprising the nitride material and the another oxide material;
• and
• transferring a pattern of the first loops and the second loops to an underlying conductive material to form a pattern of conductive lines, at least some of the conductive lines having a widened portion relative to other portions of the respective conductive lines.

A method of forming a semiconductor device, the method comprising:

• forming spacers on sides of lines of a photoresist material;
• removing the lines of the photoresist material to form a pattern of the spacers;
• transferring the pattern of the spacers to an oxide material and removing the spacers to form first lines comprising the oxide material;
• forming a nitride material over the first lines;
• forming another oxide material over the nitride material;
• removing a portion of the another oxide material to expose at least a portion of the nitride material while at least another portion of the another oxide material remains;
• removing exposed portions of the nitride material to form second lines comprising the another oxide material and the nitride material between adjacent first lines;
• transferring a pattern of the first lines and the second lines to a conductive material to form conductive lines.