System and method for manufacturing semiconductor device

A system for manufacturing a semiconductor device, includes:

• a main system controller to provides a plasma etch recipe for manufacturing a semiconductor device and identification information indicating one of
• a plurality of operations in the plasma etch recipe;
• an impedance matcher to set capacitance of a variable capacitor based on the plasma etch recipe and the identification information received from the main system controller;
• and
• a plasma chamber which performs the plasma etch recipe based on a value of a voltage or current determined by the capacitance of the variable capacitor, wherein the impedance matcher includes:
• a memory to store information indicative of a history of capacitances of the variable capacitor determined in the operations;
• a basic controller to generate a basic process control variable based on a value of a current or voltage applied to the plasma chamber and capacitances of the variable capacitor in an immediately previous operation;
• and
• an iterative learning controller to generate a learning process control variable based on the basic process control variable and the information indicative of the history of the capacitances of the variable capacitor stored in the memory, wherein capacitances of the variable capacitor in a current operation are to be determined based on basic process control variables and learning process control variables.

A method for manufacturing a semiconductor device, the method comprising:

• providing a process recipe for manufacturing a semiconductor device and identification information indicating one of a plurality of operations in the process recipe from a main system controller to a sub-system controller;
• generating a basic process control variable based on process control variables of an operation immediately before a current operation indicated by the identification information and an input value provided to a process module;
• generating a learning process control variable based on the basic process control variable and information indicative of a history of process control variables;
• and
• determining a process control variable of the current operation based on the basic process control variable and the learning process control variable.