Surface treatment of silicon and carbon containing films by remote plasma with organic precursors
AssigneeMattson Technology, Inc.
InventorsMichael X. Yang, Hua Chung, Xinliang Lu
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Abstract
Surface treatment processes for treating low-k dielectric materials are provided. One example implementation can include a method for processing a workpiece. The workpiece can include a silicon and carbon containing film material. The method can include treating the workpiece with a surface treatment process. The surface treatment process can include generating one or more species in a first chamber; mixing one or more hydrocarbon molecules with the species to create a mixture comprising one or more organic radicals; and exposing the silicon and carbon containing layer on the workpiece to the mixture in a second chamber.
Claims30
A method for processing a workpiece, the workpiece comprising a silicon and carbon containing film material, the method comprising performing an organic radical based surface treatment process on the silicon and carbon containing film material, the organic radical based surface treatment process comprising:
- generating one or more species in a first chamber;
- mixing one or more hydrocarbon molecules with the species to create a mixture comprising one or more organic radicals;
- and
- exposing the silicon and carbon containing layer on the workpiece to the mixture in a second chamber.
A method for processing a workpiece, the workpiece comprising a silicon and carbon containing film material, the method comprising treating the workpiece with an organic radical based surface treatment process, the surface treatment process comprising:
- generating one or more species from a process gas using a plasma generated in a plasma chamber of a plasma processing apparatus;
- mixing one or more hydrocarbon molecules with the species to create a mixture;
- exposing the workpiece to the mixture in a processing chamber, the processing chamber being separated from the plasma chamber.
Dependencies are inferred from the claim text.