Methods and systems for coating a substrate with a fluid
AssigneeTokyo Electron Limited
InventorHoyoung Kang
Life of this patent
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Abstract
Methods and systems for coating a substrate with a fluid are described. In an embodiment, a method may include receiving a substrate in a substrate processing unit, the substrate having one or more physical features formed on a surface of the substrate. The method may include introducing a gas into an environment of the surface of the substrate. Additionally, the method may include applying a fluid to the surface of the substrate, wherein the gas facilitates distribution of the fluid relative to the one or more physical features formed on the surface of the substrate. The method may further include controlling one or more processing parameters related to distribution of the fluid in order to achieve device formation objectives.
Claims20
A method comprising:
- receiving a substrate in a substrate processing unit, the substrate having one or more physical features formed on a surface of the substrate;
- introducing a gas into an environment of the surface of the substrate;
- applying a fluid to the surface of the substrate, wherein the gas facilitates distribution of the fluid relative to the one or more physical features formed on the surface of the substrate;
- controlling one or more processing parameters related to distribution of the fluid in order to achieve device formation objectives.
A method comprising:
- receiving a substrate in a substrate processing unit, the substrate having one or more physical features formed on a surface of the substrate;
- identifying a first gas that is dissolvable into a first fluid;
- introducing the first gas into an environment of the surface of the substrate so that the first gas fills spaces between the physical features formed on the substrate;
- depositing the first fluid onto the surface of the substrate, wherein the first gas dissolves into the first fluid resulting in the first fluid filling the spaces between the physical features formed on the substrate without gas remaining in the spaces between the physical features formed on the substrate.
Dependencies are inferred from the claim text.