Back to results
US 2019/0103257 A1Published application
Gold sputtering target
AssigneeTanaka Kikinzoku Kogyo K.K.
InventorsTetsuya KATO, Yohei Mizuno, Chiharu Ishikura
Life of this patent
Estimating the term…
Abstract
A gold sputtering target is made of gold and inevitable impurities, and has a surface to be sputtered. In the gold sputtering target, an average value of Vickers hardness is 40 or more and 60 or less, and an average crystal grain size is 15 μm or more and 200 μm or less. A {110} plane of gold is preferentially oriented at the surface to be sputtered.
Claims14
A gold sputtering target which is made of gold and inevitable impurities, comprising:
- a surface to be sputtered, wherein
- an average value of Vickers hardness is 40 or more and 60 or less,
- an average crystal grain size is 15 μm or more and 200 μm or less, and
- a {110} plane of gold is preferentially oriented at the surface.
1 more element
A manufacturing method of a gold sputtering target, comprising:
- a step of manufacturing the gold sputtering target which is made of gold and inevitable impurities, and of which an average value of Vickers hardness is 40 or more and 60 or less, an average crystal grain size is 15 μm or more and 200 μm or less, and a {110} plane of gold is preferentially oriented at a surface to be sputtered.
Dependencies are inferred from the claim text.