Multi charged particle beam writing apparatus and multi charged particle beam writing method
AssigneeNuFlare Technology, Inc.
InventorsRyoichi KAKEHI, Osamu Iizuka
Life of this patent
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Abstract
In one embodiment, a multi charged particle beam writing apparatus includes a stage position detector detecting a position of the stage which holds a substrate to be written, a mark disposed on the stage, a beam position detector detecting a beam position of each beam by allowing the multiple beams to pass over the mark, a beam shape detector detecting a beam shape of the multiple beams at predetermined time intervals based on the detected beam position and the detected position of the stage, the multiple beams being used to irradiate the substrate, and a writing data processor calculating an amount of irradiation correction of each beam for correcting the beam shape based on the detected beam shape.
Claims13
A multi charged particle beam writing apparatus comprising:
- a shaping aperture array member including a plurality of holes and configured to form multiple beams by allowing a charged particle beam to pass through the plurality of holes;
- a blanking aperture array member including a plurality of blankers each configured to turn on and off a corresponding beam of the multiple beams;
- a movable stage holding a substrate thereon, the substrate being a writing target;
- a stage position detector detecting a position of the stage;
- a mark disposed on the stage;
- a deflector deflecting the multiple beams;
- a beam position detector detecting a beam position of each beam by allowing the multiple beams to pass over the mark;
- a beam shape detector detecting a beam shape of the multiple beams at predetermined time intervals based on the detected beam position and the detected position of the stage, the multiple beams being used to irradiate the substrate;
- and
- a writing data processor calculating an amount of irradiation correction of each beam for correcting the beam shape based on the detected beam shape.
A charged particle beam writing method comprising:
- emitting a charged particle beam;
- forming multiple beams by allowing the charged particle beam to pass through a plurality of openings in an aperture member;
- performing blanking deflection involving turning on and off a corresponding beam of the multiple beams using a plurality of blankers;
- deflecting the blanking-deflected beams, using a deflector, to writing positions of the respective beams in such a manner that the beams follow movement of a stage capable of holding a substrate thereon;
- scanning a mark with the multiple beams at predetermined time intervals, the mark being disposed on the stage;
- detecting a position of each beam of the multiple beams by the scanning;
- detecting a beam shape of the multiple beams based on the detected position of each beam, the multiple beams being used to irradiate the substrate;
- and
- calculating an amount of irradiation correction of each beam for correcting the beam shape based on the detected beam shape.
Dependencies are inferred from the claim text.