Depth-controllable ion milling
AssigneeSela—Solutions Enabling Nano Analysis Ltd.
InventorsVladimir Zheleznyak, Anatoli Eizner
Life of this patent
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Abstract
A method for depth controlled ion milling, the method may include (a) ion milling a calibrated area and a target area; wherein the ion milling comprises exposing an interior of the calibrated area to provide an exposed interior of the calibrated area; wherein the target area comprises a buried region of interest that is positioned at a certain depth; wherein the calibrated area comprises a certain layer that is positioned at the certain depth; wherein the certain layer is visually distinguishable from another layer of the calibrated area that is precedes the certain layer; (ii) monitoring a progress of the milling by viewing the exposed interior of the calibrated area; and (iii) controlling of the ion milling based on an outcome of the monitoring.
Claims21
A method for depth controlled ion milling, the method comprises:
- ion milling a calibrated area and a target area;
- wherein the ion milling comprises exposing an interior of the calibrated area to provide an exposed interior of the calibrated area;
- wherein the target area comprises a buried region of interest that is positioned at a certain depth;
- wherein the calibrated area comprises a certain layer that is positioned at the certain depth;
- wherein the certain layer is visually distinguishable from another layer of the calibrated area that is precedes the certain layer;
- monitoring a progress of the milling by viewing the exposed interior of the calibrated area;
- and
- controlling of the ion milling based on an outcome of the monitoring.
A non-transitory computer readable medium that stores instructions that once executed by a computerized system causes the computerized system to execute the steps of:
- ion milling a calibrated area and a target area;
- wherein the ion milling comprises exposing an interior of the calibrated area to provide an exposed interior of the calibrated area;
- wherein the target area comprises a buried region of interest that is positioned at a certain depth;
- wherein the calibrated area comprises a certain layer that is positioned at the certain depth;
- wherein the certain layer is visually distinguishable from another layer of the calibrated area that is precedes the certain layer;
- monitoring a progress of the milling by viewing the exposed interior of the calibrated area;
- and
- controlling of the ion milling based on an outcome of the monitoring.
A computerized system comprising an ion miller, a controller, and a monitor;
- wherein the ion miller is configured to mill a calibrated area and a target area;
- wherein the ion milling comprises exposing an interior of the calibrated area to provide an exposed interior of the calibrated area;
- wherein the target area comprises a buried region of interest that is positioned at a certain depth;
- wherein the calibrated area comprises a certain layer that is positioned at the certain depth;
- wherein the certain layer is visually distinguishable from another layer of the calibrated area that is precedes the certain layer;
- wherein the monitor is configured to monitor a progress of the milling by viewing the exposed interior of the calibrated area;
- and
- wherein the controller is configured to control the ion milling based on an outcome of the monitoring.
Dependencies are inferred from the claim text.