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US 2019/0103248 A1Published application
Inspection method for wafer or dut
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsBao-Hua NIU, Jung-Hsiang CHUANG, David Hung-I SU
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Abstract
A method includes applying a voltage to a wafer or a device under test (DUT). The wafer or the DUT is illuminated with an electron beam after applying the voltage to the wafer or the DUT. Cathodoluminescent light emitted from the wafer or the DUT in response to the electron beam is detected. One or more characteristics of the wafer or the DUT are determined based on the detected cathodoluminescent light.
Claims20
A method, comprising:
- applying a voltage to a wafer or a device under test (DUT);
- illuminating the wafer or the DUT with an electron beam after applying the voltage to the wafer or the DUT;
- detecting cathodoluminescent light emitted from the wafer or the DUT in response to the electron beam;
- and
- determining one or more characteristics of the wafer or the DUT based on the detected cathodoluminescent light.
2 more elements
A method, comprising:
- illuminating a wafer or a device under test (DUT) with an electron beam;
- diffracting cathodoluminescent light emitted from the wafer or the DUT in response to the electron beam into a plurality of light beams;
- detecting the light beams;
- and
- determining one or more characteristics of the wafer or the DUT based on the detected light beams.
2 more elements
A method, comprising:
- illuminating a wafer or a device under test (DUT) with an electron beam;
- collecting, using a first reflective lens and a second reflective lens, cathodoluminescent light emitted from the wafer or the DUT in response to the electron beam, wherein the first reflective lens has an aperture therein, the second reflective lens has an aperture therein, and illuminating the wafer or the DUT is performed such that the electron beam passes through the aperture of the first reflective lens and the aperture of the second reflective lens;
- detecting the collected cathodoluminescent light;
- and
- determining one or more characteristics of the wafer or the DUT based on the detected cathodoluminescent light.
2 more elements
Dependencies are inferred from the claim text.