Reticle backside inspection method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsZi-Wen CHEN, Po-Chung CHENG, Chih-Tsung SHIH, Li-Jui CHEN, Shih-Chang SHIH
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsZi-Wen CHEN, Po-Chung CHENG, Chih-Tsung SHIH, Li-Jui CHEN, Shih-Chang SHIH
Estimating the term…
A method of inspecting a reticle includes obtaining a first image of a surface of the reticle at a first height by scanning the reticle surface with a light source at the first height of the reticle surface relative to a reference surface height of the reticle surface and obtaining a second image of the reticle surface at a second height by scanning the reticle surface with the light source at the second height of the reticle surface relative to the reference surface height of the reticle surface. The second height is different from the first height. The first and the second images are then combined to obtain a surface profile image of the reticle.
A method of inspecting a reticle, comprising:
A reticle inspection system, comprising:
An apparatus for obtaining a surface profile map of a reticle surface, the apparatus comprising:
Dependencies are inferred from the claim text.